F. Salehuddin
College of Engineering, Universiti Tenaga Nasional, Km 7, Jalan Kajang-Puchong, 43009 Kajang, Selangor, Malaysia
I. Ahmad
College of Engineering, Universiti Tenaga Nasional, Km 7, Jalan Kajang-Puchong, 43009 Kajang, Selangor, Malaysia
F. A. Hamid
College of Engineering, Universiti Tenaga Nasional, Km 7, Jalan Kajang-Puchong, 43009 Kajang, Selangor, Malaysia
A. Zaharim
Faculty of Engineering and Built Environment, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor, Malaysia
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How to cite this article
F. Salehuddin, I. Ahmad, F. A. Hamid and A. Zaharim, 2011. Optimization of Process Parameter Variability in 45 nm PMOS Device using Taguchi Method. Journal of Applied Sciences, 11: 1261-1266.
DOI: 10.3923/jas.2011.1261.1266
URL: https://scialert.net/abstract/?doi=jas.2011.1261.1266
DOI: 10.3923/jas.2011.1261.1266
URL: https://scialert.net/abstract/?doi=jas.2011.1261.1266